Semiconductor light emitting device and method for manufacturing same

ABSTRACT

According to one embodiment, a semiconductor light emitting device includes a semiconductor layer, a first electrode, a second electrode, an insulating layer, a first interconnect layer, a second interconnect layer, a first metal pillar, a second metal pillar, a film covering a side face of the first metal pillar and a side face of the second metal pillar, and a resin layer. The semiconductor layer includes a light emitting layer, a first major surface, and a second major surface formed on a side opposite to the first major surface. The film has a solder wettability poorer than a solder wettability of the first metal pillar and a solder wettability of the second metal pillar. The resin layer covers at least part of the film.

CROSS-REFERENCE TO RELATED APPLICATION

This application is based upon and claims the benefit of priority fromJapanese Patent Application No. 2010-118698, filed on May 24, 2010; theentire contents of which are incorporated herein by reference.

FIELD

Embodiments described herein relate generally to a semiconductor lightemitting device and a method for manufacturing the same.

BACKGROUND

Known technology uses, for example, solder to perform flip chip mountingof an LED (Light Emitting Diode) chip in which an n-side electrode and ap-side electrode are formed on one major surface side of a semiconductorlayer. In such a flip chip structure, it is desirable to downsizewithout harming reliability.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A to 1C are diagrams of a semiconductor light emitting device ofa first embodiment;

FIG. 2A to FIG. 12B are diagrams illustrating a method for manufacturingthe semiconductor light emitting device of the first embodiment;

FIGS. 13A and 13B are diagrams of a semiconductor light emitting deviceof a second embodiment;

FIGS. 14A and 14B are diagrams illustrating a method for manufacturingthe semiconductor light emitting device of the second embodiment;

FIGS. 15A and 15B are diagrams of a semiconductor light emitting deviceof a third embodiment;

FIG. 16A to FIG. 19B are diagrams illustrating a method formanufacturing the semiconductor light emitting device of the thirdembodiment;

FIGS. 20A and 20B are diagrams of a semiconductor light emitting deviceof a fourth embodiment;

FIG. 21A to FIG. 24B are diagrams illustrating a method formanufacturing the semiconductor light emitting device of the fourthembodiment;

FIGS. 25A and 25B are diagrams illustrating a variation of a lens and afluorescent layer; and

FIG. 26 is a diagram illustrating a tombstone defect during mounting.

DETAILED DESCRIPTION

According to one embodiment, a semiconductor light emitting deviceincludes a semiconductor layer, a first electrode, a second electrode,an insulating layer, a first interconnect layer, a second interconnectlayer, a first metal pillar, a second metal pillar, a film covering aside face of the first metal pillar and a side face of the second metalpillar, and a resin layer. The semiconductor layer includes a lightemitting layer, a first major surface, and a second major surface formedon a side opposite to the first major surface. The first electrode isprovided on the second major surface in a region including the lightemitting layer. The second electrode is provided on the second majorsurface. The insulating layer is provided on a side of the second majorsurface of the semiconductor layer. The insulating layer has a firstopening reaching the first electrode and a second opening reaching thesecond electrode. The first interconnect layer is provided in the firstopening and on a face of the insulating layer on a side opposite to thesemiconductor layer to connect to the first electrode. The secondinterconnect layer is provided in the second opening and on a face ofthe insulating layer on a side opposite to the semiconductor layer toconnect to the second electrode. The first metal pillar is provided on aface of the first interconnect layer on a side opposite to the firstelectrode. The second metal pillar is provided on a face of the secondinterconnect layer on a side opposite to the second electrode. The filmhas a solder wettability poorer than a solder wettability of the firstmetal pillar and a solder wettability of the second metal pillar. Theresin layer is provided between the first metal pillar and the secondmetal pillar and covers at least part of the film.

Exemplary embodiments will now be described with reference to thedrawings. Similar components in the drawings are marked with likereference numerals. Further, partial regions of the wafer state areillustrated in drawings illustrating processes.

First Embodiment

FIG. 1A is a schematic cross-sectional view of a semiconductor lightemitting device of a first embodiment; and

FIG. 1B is a bottom view thereof.

The semiconductor light emitting device of this embodiment has astructure in which electrodes and interconnect layers are provided onone major surface (a second major surface) side (lower side) of asemiconductor layer 15. Light is extracted mainly from a first majorsurface 15 a on the side opposite to the second major surface.

The semiconductor layer 15 includes a first semiconductor layer 11 and asecond semiconductor layer 13. The first semiconductor layer 11 is, forexample, an n-type GaN layer that functions as a lateral current path.However, the conductivity type of the first semiconductor layer 11 isnot limited to the n-type; and the conductivity type may be a p-type.The second semiconductor layer 13 has a stacked structure in which alight emitting layer (an active layer) 12 is interposed between ann-type layer and a p-type layer.

The second major surface side of the semiconductor layer 15 is patternedinto a recessed and protruding configuration to provide an upper levelportion and a lower level portion on the second major surface side. Theupper level portion, which is positioned more on the upper level sidethan is the lower level portion as viewed from the first major surface15 a, includes the light emitting layer 12. The lower level portion doesnot include the light emitting layer 12 and is provided outside theouter circumference of the light emitting layer 12.

A p-side electrode 16 is provided as a first electrode on the surface ofthe second interconnect layer 13, i.e., the surface of the upper levelportion. In other words, the p-side electrode 16 is provided in a regionincluding the light emitting layer 12. An n-side electrode 17 isprovided as a second electrode on the surface of the first interconnectlayer 11 of the lower level portion.

FIG. 2B illustrates one example of a planar layout of the p-sideelectrode 16 and the n-side electrode 17. In the semiconductor layer 15,the surface area of the p-side electrode 16 is greater than the surfacearea of the n-side electrode 17. Accordingly, a large light emittingregion can be obtained.

As illustrated in FIG. 1A, an insulating layer 18 covers the secondmajor surface side of the semiconductor layer 15. The insulating layer18 also covers the end face (the side face) of the semiconductor layer15. The insulating layer 18 is, for example, a resin such as polyimidehaving excellent patternability of ultra-fine openings. Alternatively,silicon oxide may be used as the insulating layer 18.

The face of the insulating layer 18 on the side opposite to thesemiconductor layer 15 is planarized; and a p-side interconnect layer 21is provided as a first interconnect layer and an n-side interconnectlayer 22 is provided as a second interconnect layer on the planarizedface. The p-side interconnect layer 21 is provided also in a firstopening 18 a made in the insulating layer 18 to reach the p-sideelectrode 16; and the p-side interconnect layer 21 is connected to thep-side electrode 16. The n-side interconnect layer 22 is provided alsoin a second opening 18 b made in the insulating layer 18 to reach then-side electrode 17; and the n-side interconnect layer 22 is connectedto the n-side electrode 17.

A p-side metal pillar 23 is provided as a first metal pillar on the faceof the p-side interconnect layer 21 on the side opposite to the p-sideelectrode 16. An n-side metal pillar 24 is provided as a second metalpillar on the face of the n-side interconnect layer 22 on the sideopposite to the n-side electrode 17.

An insulating film 26 is formed on the side face of the p-side metalpillar 23 and the side face of the n-side metal pillar 24. The p-sidemetal pillar 23 and the n-side metal pillar 24, for example, are made ofcopper or include mainly copper. The solder wettability of theinsulating film 26 is poorer than that of copper. Solder wettabilityrefers to the property of solder where the solder melted on a metalsurface spreads without being repelled. For example, the insulating film26 is an inorganic film such as a silicon oxide film, a silicon nitridefilm, etc.

As illustrated in FIG. 1B, the insulating film 26 continuously coversthe periphery of the side face of the p-side metal pillar 23 and theperiphery of the side face of the n-side metal pillar 24. The insulatingfilm 26 is formed also on a portion on the insulating layer 18 betweenthe p-side interconnect layer 21 and the n-side interconnect layer 22.

A resin layer 25 covers the n-side interconnect layer 22, the p-sideinterconnect layer 21, and the periphery of the insulating film 26. Theresin layer 25 is filled between the p-side metal pillar 23 and then-side metal pillar 24 and reinforces the p-side metal pillar 23 and then-side metal pillar 24. The lower face of the p-side metal pillar 23 andthe lower face of the n-side metal pillar 24 are exposed from the resinlayer 25.

The contact surface area between the n-side interconnect layer 22 andthe n-side metal pillar 24 is greater than the contact surface areabetween the n-side interconnect layer 22 and the n-side electrode 17.

In other words, the surface area of the n-side interconnect layer 22connected to the n-side electrode 17 provided on the portion of thesemiconductor layer 15 not including the light emitting layer 12 isgreater at the face on the side opposite to the n-side electrode 17 thanat the face on the n-side electrode 17 side. Further, a portion of then-side interconnect layer 22 extends over the insulating layer 18 to anoverlaying position below the light emitting layer 12.

Thereby, a larger draw out electrode can be formed via the n-sideinterconnect layer 22 from the n-side electrode 17 provided on a portionof the semiconductor layer 15 not including the light emitting layer 12and having a small surface area while maintaining a high light output byhaving a larger light emitting layer 12.

The first semiconductor layer 11 is electrically connected to the n-sidemetal pillar 24 via the n-side electrode 17 and the n-side interconnectlayer 22. The second semiconductor layer 13 is electrically connected tothe p-side metal pillar 23 via the p-side electrode 16 and the p-sideinterconnect layer 21.

As illustrated in FIG. 1C, external terminals such as, for example,solder 50 having ball configurations are provided on the lower faces ofthe n-side metal pillar 24 and the p-side metal pillar 23 exposed fromthe resin layer 25. The semiconductor light emitting device iselectrically connectable to the external circuit via the solder 50 andthe pads 82 a and 82 b, interconnects, etc., formed on a mountingsubstrate 81. The solder 50 includes, for example, tin (Sn), silver(Ag), bismuth (Bi), copper (Cu), etc.

Alternatively, the lower faces of the n-side metal pillar 24 and thep-side metal pillar 23 may be covered with an inert metal, e.g., goldand the like. In such a case, the semiconductor light emitting device ismounted on the mounting substrate 81 on which solder paste is printed;and the solder wets onto the gold surface to make the connection. Also,it is possible to cover the lower faces of the n-side metal pillar 24and the p-side metal pillar 23 with nonvolatile organic thin filmscalled OSP (organic solderbility preservatives). In such a case, theconnection is made by the solder wetting onto a copper surface whereoxidation is suppressed by being covered with the OSP.

Each of the thickness of the n-side metal pillar 24 and the thickness ofthe p-side metal pillar 23 (the thickness in the vertical direction inFIG. 1A) is thicker than the thickness of a stacked body including thesemiconductor layer 15, the n-side electrode 17, the p-side electrode16, the insulating layer 18, the n-side interconnect layer 22, and thep-side interconnect layer 21. The aspect ratios of the metal pillars 23and 24 (the ratio of the thickness to the planar size) are not limitedto 1 or more; and the ratios may be less than 1. In other words, thethicknesses of the metal pillars 23 and 24 may be smaller than theplanar sizes thereof.

According to the structure of this embodiment, it is possible tomaintain the mechanical strength even in the case where thesemiconductor layer 15 is thin by increasing the thicknesses of then-side metal pillar 24, the p-side metal pillar 23, and the resin layer25. In the case of mounting on the mounting substrate 81, the n-sidemetal pillar 24 and the p-side metal pillar 23 can absorb and mitigatethe stress applied to the semiconductor layer 15 via the solder 50.

The materials of the n-side interconnect layer 22, the p-sideinterconnect layer 21, the n-side metal pillar 24, and the p-side metalpillar 23 may include copper, gold, nickel, silver, etc. Thereof, copperis more favorable because copper provides good thermal conductivity,high migration resistance, and excellent adhesion with insulating films.

It may be possible for the resin layer 25, which performs the role ofreinforcing the n-side metal pillar 24 and the p-side metal pillar 23,to be a substance having a coefficient of thermal expansion equal to ornear that of the mounting substrate 81. Examples of such a resin layer25 may include, for example, epoxy resin, silicone resin, fluorocarbonresin, etc.

A lens 27 and a fluorescent layer 28 are provided on the first majorsurface 15 a of the semiconductor layer 15. The fluorescent layer 28 iscapable of absorbing light from the light emitting layer 12 and emittingwavelength-converted light. Therefore, it is possible to emit mixedlight of the light from the light emitting layer 12 and thewavelength-converted light of the fluorescent layer 28. In the casewhere, for example, the light emitting layer 12 is nitride-based, it ispossible to obtain white light, lamp light, etc., as mixed-color lightof blue light from the light emitting layer 12 and yellow light from,for example, the wavelength-converted light of a yellow fluorescentlayer 28. The fluorescent layer 28 may have a configuration includingmultiple types of phosphors (e.g., a red phosphor and a green phosphor).

The light emitted by the light emitting layer 12 travels mainly throughthe first semiconductor layer 11, the first major surface 15 a, the lens27, and the fluorescent layer 28 to be emitted externally.

A method for manufacturing the semiconductor light emitting device ofthis embodiment will now be described with reference to FIG. 2A to FIG.12B.

First, the first semiconductor layer 11 is formed on the major surfaceof a substrate 10; and the second semiconductor layer 13 including thelight emitting layer 12 is formed thereupon. In the case where suchlayers of the semiconductor layer 15 are, for example, nitridesemiconductors, the semiconductor layer 15 may be formed by, forexample, crystal growth on a sapphire substrate.

Then, as illustrated in FIG. 2A and FIG. 2B, which is the bottom view ofFIG. 2A, a separating trench 14 is made to pierce the semiconductorlayer 15 and reach the substrate 10 by, for example, Reactive IonEtching (RIE) using a not-illustrated resist. The separating trench 14is made, for example, in a lattice configuration on the substrate 10 tomultiply separate the semiconductor layer 15.

A portion of the second semiconductor layer 13 including the lightemitting layer 12 is removed by, for example, RIE using anot-illustrated resist to expose a portion of the first semiconductorlayer 11. Thereby, the upper level portion is formed on the second majorsurface side of the semiconductor layer 15 to be positioned relativelyin the upper level as viewed from the substrate 10; and the lower levelportion is formed on the second major surface side of the semiconductorlayer 15 to be positioned more in the lower level on the substrate 10side than is the upper level portion. The upper level portion includesthe light emitting layer 12; and the lower level portion does notinclude the light emitting layer 12.

Then, the p-side electrode 16 is formed on the surface of the upperlevel portion (the surface of the second semiconductor layer 13); andthe n-side electrode 17 is formed on the surface of the lower levelportion (the surface of the first semiconductor layer 11). Either thep-side electrode 16 or the n-side electrode 17 may be formed prior tothe other; or, the p-side electrode 16 and the n-side electrode 17 maybe formed simultaneously from the same material.

Then, after covering the exposed portions of the substrate 10 with theinsulating layer 18, the insulating layer 18 is patterned as illustratedin FIG. 3A by, for example, wet etching to make the first opening 18 aand the second opening 18 b selectively in the insulating layer 18. Thefirst opening 18 a reaches the p-side electrode 16. The second opening18 b reaches the n-side electrode 17. The insulating layer 18 is filledinto the separating trench 14.

Then, as illustrated in FIG. 3B, a continuous seed metal 19 is formed onthe surface of the insulating layer 18 and on the inner faces of thefirst opening 18 a and the second opening 18 b. Further, a resist 41 isformed selectively on the seed metal 19; and Cu electroplating isperformed using the seed metal 19 as a current path.

Thereby, as illustrated in FIG. 4A and FIG. 4B, i.e., the bottom view ofFIG. 4A, the p-side interconnect layer 21 and the n-side interconnectlayer 22 are formed selectively on the seed metal 19. The p-sideinterconnect layer 21 and the n-side interconnect layer 22 are made of acopper material formed simultaneously by plating. The p-sideinterconnect layer 21 is formed also in the first opening 18 a toconnect to the p-side electrode 16 via the seed metal 19. The n-sideinterconnect layer 22 is formed also in the second opening 18 b toconnect to the n-side electrode 17 via the seed metal 19.

The face of the n-side interconnect layer 22 on the side opposite to then-side electrode 17 is formed in a pad configuration on the surface ofthe insulating layer 18 and has a surface area greater than that of theface of the n-side interconnect layer 22 connected to the n-sideelectrode 17. The face of the p-side interconnect layer 21 on the sideopposite to the p-side electrode 16 is formed in a pad configuration onthe surface of the insulating layer 18 and has a surface area greaterthan the surface area of the face of the p-side interconnect layer 21connected to the p-side electrode 16.

The resist 41 used during the plating of the p-side interconnect layer21 and the n-side interconnect layer 22 is removed with, for example, achemical solution (FIG. 5A). Subsequently, as illustrated in FIG. 5B,another resist 42 is formed for forming the metal pillars; and Cuelectroplating is performed using the seed metal 19 as a current path.The resist 42 is thicker than the resist 41.

Thereby, as illustrated in FIG. 6A and FIG. 6B, i.e., the bottom view ofFIG. 6A, the p-side metal pillar 23 is formed on the p-side interconnectlayer 21; and the n-side metal pillar 24 is formed on the n-sideinterconnect layer 22. The p-side metal pillar 23 and the n-side metalpillar 24 are made of a copper material formed simultaneously byplating.

The resist 42 is removed with, for example, a chemical solution (FIG.7A). Subsequently, wet etching is performed on the exposed portions ofthe seed metal 19 using the p-side metal pillar 23 and the n-side metalpillar 24 as a mask (FIG. 7B). Thereby, the electrical connectionbetween the p-side interconnect layer 21 and the n-side interconnectlayer 22 via the seed metal 19 is divided.

Then, the insulating film 26 is formed on the exposed portions on thesubstrate 10 by, for example, chemical vapor deposition (CVD) orphysical vapor deposition (PVD) such as sputtering. As illustrated inFIG. 8A, the insulating film 26 covers the side face of the p-side metalpillar 23 and the lower face thereof and the side face of the n-sidemetal pillar 24 and the lower face thereof. The insulating film 26surrounds side surfaces of the p-side metal pillar 23 and the n-sidemetal pillar 24. The insulating film 26 is formed also on the surface ofthe insulating layer 18 in the portions where the seed metal 19 isremoved. Side surfaces of the p-side interconnect layer 21 and then-side interconnect layer 22 are surrounded by the insulating film 26. Aportion of a lower surface of the p-side interconnect layer 21 which isnot provided below the p-side metal pillar 23, is covered with theinsulating film 26.

Then, as illustrated in FIG. 8B, the resin layer 25 is stacked on theinsulating layer 18. The resin layer 25 covers the portions covered withthe insulating film 26. In other words, the resin layer 25 is filledbetween the p-side interconnect layer 21 and the n-side interconnectlayer 22, and between the p-side metal pillar 23 and the n-side metalpillar 24. The resin layer 25 covers the periphery of the p-side metalpillar 23 and the periphery of the n-side metal pillar 24 via theinsulating film 26.

Subsequently, the substrate 10 is removed as illustrated in FIG. 9A andFIG. 9B. The substrate 10 may be removed by, for example, laserlift-off. Specifically, laser light is irradiated from the backside ofthe substrate 10 toward the first semiconductor layer 11. The substrate10 is permeable to laser light; and the laser light has a wavelength inthe absorption region of the first semiconductor layer 11.

When the laser light reaches the interface between the substrate 10 andthe first semiconductor layer 11, the first semiconductor layer 11proximal to the interface absorbs the energy of the laser light anddecomposes. For example, in the case where the first semiconductor layer11 is GaN, the first semiconductor layer 11 decomposes into Ga andnitrogen gas. A micro gap is formed between the substrate 10 and thefirst semiconductor layer 11 by the decomposition reaction; and thesubstrate 10 and the first semiconductor layer 11 separate.

The irradiation of the laser light is performed over the entire wafer byperforming multiply for each set region; and the substrate 10 isremoved. The light extraction efficiency can be increased by removingthe substrate 10 from the first major surface 15 a.

The face where the substrate 10 is removed is cleaned; and surfaceroughening is performed by frosting. The light extraction efficiency canbe increased by roughening the first major surface 15 a.

Here, the layer made of the resin and the metal is flexible, and themetal is formed by plating at near room temperature. Hence, the residualstress occurring with respect to the translucent substrate 10 isrelatively low.

In the conventional technique for separating the semiconductor layerfrom the translucent substrate at wafer level, for example, it is bondedto a silicon substrate with a metal layer formed thereon using Au—Snsolder at a high temperature of 300° C. or more, and then thesemiconductor layer made of GaN is separated by laser irradiation.However, in this conventional technique, the translucent substrate andthe silicon substrate being different in thermal expansion coefficientare both rigid, and are bonded together at high temperature. Hence, ahigh residual stress remains between these substrates. Consequently,when the separation is started by laser irradiation, the residual stressis locally relieved from the separated portion and unfortunately causescracks in the thin, brittle semiconductor layer.

In contrast, in this embodiment, the residual stress is low, and thesemiconductor layer 15 is separated in the state of being fixed to aflexible support. Hence, the device can be manufactured at high yieldwithout trouble such as cracking in the semiconductor layer 15.

Subsequently, the lens 27 is formed on the first major surface 15 a asillustrated in FIG. 10A; and the fluorescent layer 28 is formed on thelens 27 as illustrated in FIG. 10B. The fluorescent layer 28 may beformed, for example, by coating a liquid transparent resin in whichphosphor particles are dispersed by spin coating and then thermosetting.

Subsequently, the back (bottom) face of the resin layer 25 is polished.The insulating film 26 formed on the lower face of the p-side metalpillar 23 and the lower face of the n-side metal pillar 24 is removed.Thereby, as illustrated in FIG. 11A and FIG. 11B, which is the bottomview of FIG. 11A, the lower face of the p-side metal pillar 23 and thelower face of the n-side metal pillar 24 are exposed.

Subsequently, singulation into multiple semiconductor light emittingdevices (FIGS. 12A and 12B) is performed by dicing at the position ofthe separating trench 14 (FIGS. 2A and 2B). The substrate 10 is alreadyremoved during the dicing. Further, the dicing is easy because thesemiconductor layer 15 does not exist in the separating trench 14 and aresin is filled as an insulating layer in the separating trench 14beforehand; and the productivity can be increased. Further, damage tothe semiconductor layer 15 during the dicing can be avoided. Also, astructure is obtained after singulation in which the end portion (theside face) of the semiconductor layer 15 is covered with resin andprotected.

The singulated semiconductor light emitting device may have asingle-chip structure including one semiconductor layer 15 or amulti-chip structure including multiple semiconductor layers 15.

Turning now to FIG. 26, a mounting defect of the structure of acomparative example in which the side face of the p-side metal pillar 23and the side face of the n-side metal pillar 24 are directly coveredwith the resin layer 25. FIG. 26 illustrates the state in which aportion of the resin layer 25 peels during the dicing and, for example,the side face of the p-side metal pillar 23 is exposed.

When the solder 50 melts during the reflow of the mounting in such astate, a tombstone defect may occur in which the solder 50 wets andcreeps up onto the exposed pillar side face and the device tilts suchthat one of the pillar sides (in this case, the n-side metal pillar 24)rises up. Such a raised n-side metal pillar 24 is not bonded to the pad82 b. Generally, an metal has a better solder wettability thaninsulating materials. Therefore, the solder so wets and creeps up easieronto the exposed the p-side metal pillar 23, with compare to the resinlayer 25.

In case copper is used for the p-side metal pillar 23 and the n-sidemetal pillar 24 considering the heat dissipation, costs, processstability due to plating, etc. However, solder has extremely good copperwettability; and tombstone defects easily occur. This is not limited tothe case Cu is used as the metal pillar.

Even in the case where normal mounting is performed, the pillar sideface which is a conductive surface is exposed. Therefore, electricaldefects such as shorts due to dirt occur easily.

In this embodiment, the insulating film 26 covers the side face of thep-side metal pillar 23 and the side face of the n-side metal pillar 24.Accordingly, even in the case where chipping and peeling of the resinlayer 25 occur during and/or after the dicing, the side face of thep-side metal pillar 23 and the side face of the n-side metal pillar 24are not exposed. Further, the insulating film 26 is an inorganic filmhaving a solder wettability poorer than that of the metal (e.g., copper)included in the p-side metal pillar 23 and the n-side metal pillar 24.Therefore, the wetting of the solder 50 upward onto the insulating film26 of the pillar side face can be suppressed even in the case where theinsulating film 26 is exposed during the reflow of the solder 50. As aresult, bonding defects, shorts due to contamination, etc., can beavoided.

By forming the insulating film 26 from an inorganic film such as asilicon oxide film, a silicon nitride film, etc., formed by, forexample, CVD or PVD, the side face of the p-side metal pillar 23 and theside face of the n-side metal pillar 24 can be continuously coveredreliably by stable processes.

The separating trench 14 which is in the dicing region is an ineffectiveregion where the device is not formed; and it is good for the width tobe as small as possible. Also, it is good for the cross-sectional areas(the planar sizes) of the p-side metal pillar 23 and the n-side metalpillar 24 to be large to increase the heat dissipation of thesemiconductor light emitting device. In the case where the separatingtrench 14 is smaller and the cross-sectional areas of the p-side metalpillar 23 and the n-side metal pillar 24 are larger, the thickness ofthe resin layer 25 covering the side faces of the p-side metal pillar 23and the n-side metal pillar 24 on the dicing region side becomes thin;and the pillar side faces are exposed easily due to chipping and peelingduring and/or after the dicing.

However, in this embodiment, even in the case where chipping and peelingof the resin layer 25 occur, it is the insulating film 26 that isexposed; and mounting defects and short defects can be avoided.Accordingly, the thickness of the resin layer 25 covering the side faceof the p-side metal pillar 23 and the side face of the n-side metalpillar 24 need not be thicker than necessary. As a result, the width ofthe dicing region can be narrower; and the number of chips per wafer canbe increased. Further, the cross-sectional area of the pillars and thesolder bonded thereto can be increased. Therefore, the heat dissipationcan be increased.

Because the processes described above up to the dicing are performedcollectively in the wafer state, it is unnecessary to performinterconnections and packaging for each of the singulated devices; andit is possible to reduce production costs. In other words, theinterconnections and the packaging are already complete in thesingulated state. Moreover, downsizing is easy in the case where theplanar size of each device approaches the planar size of the bare chip(the semiconductor layer 15). Also, inspections are possible at thewafer level. Therefore, the productivity can be increased. As a result,cost reductions are easy.

Second Embodiment

FIG. 13A is a schematic cross-sectional view of a semiconductor lightemitting device of a second embodiment; and FIG. 13B is a bottom viewthereof.

In this embodiment, an insulating film 31 is formed on the side face ofthe p-side metal pillar 23 and the side face of the n-side metal pillar24. The p-side metal pillar 23 and the n-side metal pillar 24, forexample, are made of copper or include mainly copper. The insulatingfilm 31 is a black oxide of the copper (Cu₂O). The solder wettability ofthe insulating film 31 is poorer than that of copper. As illustrated inFIG. 13B, the insulating film 31 continuously covers the periphery ofthe side face of the p-side metal pillar 23 and the periphery of theside face of the n-side metal pillar 24. The resin layer 25 covers then-side interconnect layer 22, the p-side interconnect layer 21, and theperiphery of the insulating film 31. The insulating film 31 surroundsside surfaces of the p-side metal pillar 23 and the n-side metal pillar24. Side surfaces of the p-side interconnect layer 21 and the n-sideinterconnect layer 22 are surrounded by the insulating film 31. Aportion of a lower surface of the p-side interconnect layer 21 which isnot provided below the p-side metal pillar 23, is covered with theinsulating film 31.

Covering films of cuprous oxide have excellent adhesion with resins; andthe chipping and the peeling of the resin layer 25 during and/or afterthe dicing do not occur easily. Even in the case where the chipping andthe peeling of the resin layer 25 occur, the side face of the p-sidemetal pillar 23 and the side face of the n-side metal pillar 24 are notexposed. The solder wettability of the insulating film 31 is poorer thanthat of the metal (e.g., copper) included in the p-side metal pillar 23and the n-side metal pillar 24. Therefore, the wetting of the solderupward onto the insulating film 31 of the pillar side face is suppressedeven in the case where the insulating film 31 is exposed during thereflow of the solder. As a result, bonding defects due to the tombstonephenomenon can be avoided. Moreover, because the film is an insulatingfilm, shorts due to contamination and the like can be avoided.

The processes of the semiconductor light emitting device of thisembodiment up to the process of FIG. 7B proceed similarly to those ofthe first embodiment described above.

Then, after the process of FIG. 7B, that is, after performing the wetetching of the exposed portions of the seed metal 19 to divide theelectrical connection between the p-side interconnect layer 21 and then-side interconnect layer 22 via the seed metal 19, the followingprocesses are performed.

For example, the wafer is immersed in mixed chemicals of sodium chloriteand sodium hydroxide to oxidize the exposed faces of the p-side metalpillar 23 and the n-side metal pillar 24. Thereby, as illustrated inFIG. 14A, the insulating film 31 of cuprous oxide, i.e., a film of blackoxide of the copper, is formed on the side face of the p-side metalpillar 23 and the lower face thereof and the side face of the n-sidemetal pillar 24 and the lower face thereof.

Then, as illustrated in FIG. 14B, the resin layer 25 is stacked on theinsulating layer 18. Thereinafter, the processes proceed similarly tothose of the first embodiment.

By polishing the back face of the resin layer 25 to remove theinsulating film 31 formed on the lower face of the p-side metal pillar23 and the lower face of the n-side metal pillar 24, the lower face ofthe p-side metal pillar 23 and the lower face of the n-side metal pillar24 are exposed as illustrated in FIGS. 13A and 13B. The insulating film31 has good adhesion to the p-side metal pillar 23 and the n-side metalpillar 24, since the insulating film 31 is reacted from the p-side metalpillar 23 and the n-side metal pillar 24.

Third Embodiment

FIG. 15A is a schematic cross-sectional view of a semiconductor lightemitting device of a third embodiment; and FIG. 15B is a bottom viewthereof.

In this embodiment, a metal film 32 is formed on the side face of thep-side metal pillar 23 and the side face of the n-side metal pillar 24.The metal film 32 is made of a metal different from the p-side metalpillar 23 and the n-side metal pillar 24. The metal film 32 is a stackedfilm of, for example, a titanium (Ti) film and a nickel (Ni) film. Thetitanium film is formed on the side of the interface with the p-sideinterconnect layer 21, the n-side interconnect layer 22, and a resinlayer 45; and the nickel film is formed on the titanium film. The solderwettability of titanium and the solder wettability of nickel are poorerthan that of copper.

The metal film 32 is not limited to the stacked film of the titaniumfilm and the nickel film. Only one film of either the titanium film orthe nickel film may be used. Alternatively, another metal film having asolder wettability poorer than that of the copper included in the p-sidemetal pillar 23 and the n-side metal pillar 24 may be used.

As illustrated in FIG. 15B, the metal film 32 continuously covers theperiphery of the side face of the p-side metal pillar 23 and theperiphery of the side face of the n-side metal pillar 24. The resinlayer 45 covers or surrounds the n-side interconnect layer 22, thep-side interconnect layer 21, and the periphery of the metal film 32. Asdescribed below, the resist used during the plating of the p-side metalpillar 23 and the n-side metal pillar 24 remains as-is to become theresin layer 45.

In this embodiment as well, the side face of the p-side metal pillar 23and the side face of the n-side metal pillar 24 are covered with themetal film 32 and therefore are not exposed even in the case where thechipping and the peeling of the resin layer 45 occur. The metal film 32has a solder wettability poorer than that of the metal (e.g., copper)included in the p-side metal pillar 23 and the n-side metal pillar 24.Therefore, the wetting of the solder upward onto the metal film 32 ofthe pillar side face can be suppressed even in the case where the metalfilm 32 is exposed during the reflow of the solder. As a result, thebonding defects due to the tombstone phenomenon can be avoided.

The semiconductor light emitting device of this embodiment up to theremoval of the resist 41 used during the plating of the p-sideinterconnect layer 21 and the n-side interconnect layer 22 (FIG. 16A)proceeds similarly to the first embodiment described above.

Subsequently, as illustrated in FIG. 16B, wet etching is performed onthe exposed portions of the seed metal 19 using the p-side interconnectlayer 21 and the n-side interconnect layer 22 as a mask. Thereby, theelectrical connection between the p-side interconnect layer 21 and then-side interconnect layer 22 via the seed metal 19 is divided.

Subsequently, as illustrated in FIG. 17A and FIG. 17B, i.e., the bottomview of FIG. 17A, the resin layer 45 also used as a plating resist isformed to cover the insulating layer 18, the p-side interconnect layer21, and the n-side interconnect layer 22. Subsequently, openings 45 aand 45 b are made selectively. The opening 45 a reaches the p-sideinterconnect layer 21; and the opening 45 b reaches the n-sideinterconnect layer 22.

The resin layer 45 is cured and remains after the plating as well.Accordingly, a durable material for reliability may be used as areinforcing resin of the p-side metal pillar 23 and the n-side metalpillar 24.

Then, as illustrated in FIG. 18A, the metal film 32 is formed on thesurface of the resin layer 45, on the side faces inside the openings 45a and 45 b, and on the surfaces of the p-side interconnect layer 21 andthe n-side interconnect layer 22 by CVD, PVD or the like. Then,electroplating is performed using the metal film 32 as a seed metal.

Thereby, as illustrated in FIG. 18B, the p-side metal pillar 23 isformed in the opening 45 a; and the n-side metal pillar 24 is formed inthe opening 45 b. The p-side metal pillar 23 and the n-side metal pillar24 are made of a copper material formed simultaneously by plating. Thep-side metal pillar 23 is connected to the p-side interconnect layer 21via the metal film 32; and the n-side metal pillar 24 is connected tothe n-side interconnect layer 22 via the metal film 32. The metal film32 covers the side face of the p-side metal pillar 23 and the side faceof the n-side metal pillar 24.

Subsequently, after removing the substrate 10 and forming the lens 27and the fluorescent layer 28 on the first major surface 15 a, the p-sidemetal pillar 23 and the n-side metal pillar 24 protruding from theopenings 45 a and 45 b are polished. Then, the metal film 32 is removedfrom the resin layer 45 surface. Thereby, as illustrated in FIG. 19A andFIG. 19B, i.e., the bottom view of FIG. 19A, the electrical connectionbetween the p-side metal pillar 23 and the n-side metal pillar 24 viathe metal film 32 is divided.

Fourth Embodiment

FIG. 20A is a schematic cross-sectional view of a semiconductor lightemitting device of a fourth embodiment; and FIG. 20B is a bottom viewthereof.

In this embodiment, recesses and protrusions are formed in the side faceof the p-side metal pillar 23 and the side face of the n-side metalpillar 24. For example, the recesses and protrusions are repeated as ina folding screen in a direction to enclose each of the side face of thep-side metal pillar 23 and the side face of the n-side metal pillar 24.

The resin layer 25 covers the side face of the p-side metal pillar 23and the side face of the n-side metal pillar 24. Because the recessesand protrusions are formed in the side face of the p-side metal pillar23 and the side face of the n-side metal pillar 24, the adhesionstrength between the side faces and the resin layer 25 can be increased.As a result, the chipping and the peeling of the resin layer 25 duringand/or after the dicing do not occur easily; and the undesirableexposure of the side face of the p-side metal pillar 23 and the sideface of the n-side metal pillar 24 can be suppressed.

The processes of the semiconductor light emitting device of thisembodiment up to the process of FIG. 5A proceed similarly to those ofthe first embodiment described above.

Then, the resist 42 is formed on the face of the insulating layer 18 onthe side opposite to the semiconductor layer 15 to cover the p-sideinterconnect layer 21 and the n-side interconnect layer 22.Subsequently, as illustrated in FIG. 21A and FIG. 21B, i.e., the bottomview of FIG. 21A, multiple openings 42 a and 42 b are made selectivelyin the resist 42.

The opening 42 a reaches the p-side interconnect layer 21; and theopening 42 b reaches the n-side interconnect layer 22. Recesses andprotrusions are formed in the side faces inside the openings 42 a and 42b.

The openings 42 a and 42 b are made by lithography using anot-illustrated mask. By forming recesses and protrusions in the patternof the mask corresponding to the openings 42 a and 42 b, the recessesand protrusions are formed also in the openings 42 a and 42 b made inthe resist 42.

By performing electroplating in this state, the p-side metal pillar 23is formed inside the opening 42 a; and the n-side metal pillar 24 isformed inside the opening 42 b as illustrated in FIG. 22A and FIG. 22B,i.e., the bottom view of FIG. 22A. Because the recesses and protrusionsare formed in the side faces inside the openings 42 a and 42 b, therecesses and protrusions are formed also in the side face of the p-sidemetal pillar 23 and the side face of the n-side metal pillar 24.

Subsequently, the resist 42 is removed with, for example, a chemicalsolution (FIG. 23A). Subsequently, wet etching is performed on theexposed portions of the seed metal 19 using the p-side metal pillar 23and the n-side metal pillar 24 as a mask (FIG. 23B). Thereby, theelectrical connection between the p-side interconnect layer 21 and then-side interconnect layer 22 via the seed metal 19 is divided.

Subsequently, similarly to the first embodiment, the resin layer 25 isfilled between the p-side metal pillar 23 and the n-side metal pillar24. Subsequently, after removing the substrate 10 and forming the lens27 and the fluorescent layer 28 on the first major surface 15 a, theback face of the resin layer 25 is polished. Thereby, as illustrated inFIG. 24A and FIG. 24B, i.e., the bottom view of FIG. 24A, the lower faceof the p-side metal pillar 23 and the lower face of the n-side metalpillar 24 are exposed.

This embodiment can use fewer processes than those of embodiments inwhich the side face of the p-side metal pillar 23 and the side face ofthe n-side metal pillar 24 are covered with the film.

In the embodiments described above, the substrate 10 may not be removedentirely; and the substrate 10 may be polished to thinly remain on thefirst major surface 15 a. By leaving the substrate 10 in a thin layer,the mechanical strength can be higher than that of the structure inwhich the substrate 10 is entirely removed; and a structure having highreliability can be provided. The remaining substrate 10 can suppresswarp after singulation; and the mounting onto the circuit substrate andthe like is easy.

As illustrated in FIG. 25A, after forming the fluorescent layer 28 onthe first major surface 15 a, a lens 51 may be provided on thefluorescent layer 28. Although the lens 27 having a recessedconfiguration is illustrated in the embodiments described above, a lens51 having a protruding configuration as illustrated in FIG. 25A may beused.

Or, as illustrated in FIG. 25B, after forming the lens 51 on the firstmajor surface 15 a, the fluorescent layer 28 may be formed to cover thelens 51.

A red fluorescent layer may contain, for example, a nitride-basedphosphor of CaAlSiN₃:Eu or a SiAlON-based phosphor.

In the case where a SiAlON-based phosphor is used, it may be used

(M_(1-x)R_(x))_(a1)AlSi_(b1)O_(c1)N_(d1)  Compositional Formula (1)

where M is at least one type of metal element excluding Si and Al, andit may be desirable for M to be at least one selected from Ca and Sr; Ris a light emission center element, and it may be desirable for R to beEu; and x, a1, b1, c1, and d1 satisfy the relationships 0<x≦1,0.6<a1<0.95, 2<b1<3.9, 0.25<c1<0.45, and 4<d1<5.7.

By using the SiAlON-based phosphor of Compositional

Formula (1), the temperature characteristics of the wavelengthconversion efficiency can be improved; and the efficiency in the highcurrent density region can be improved further.

A yellow fluorescent layer may contain, for example, a silicate-basedphosphor of (Sr, Ca, Ba)₂SiO₄:Eu.

A green fluorescent layer may contain, for example, ahalophosphate-based phosphor of (Ba, Ca, Mg)₁₀(PO₄)₆.Cl₂:Eu or aSiAlON-based phosphor.

In the case where a SiAlON-based phosphor is used, it may be used

(M_(1-x)R_(x))_(a2)AlSi_(b2)O_(c2)N_(d2)  Compositional Formula (2)

where M is at least one type of metal element excluding Si and Al, andit may be desirable for M to be at least one selected from Ca and Sr; Ris a light emission center element, and it may be desirable for R to beEu; and x, a2, b2, c2, and d2 satisfy the relationships 0<x≦1,0.93<a2<1.3, 4.0<b2<5.8, 0.6<c2<1, and 6<d2<11.

By using the SiAlON-based phosphor of Compositional Formula (2), thetemperature characteristics of the wavelength conversion efficiency canbe improved; and the efficiency in the high current density region canbe improved further.

A blue fluorescent layer may contain, for example, an oxide-basedphosphor of BaMgAl₁₀O₁₇:Eu.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel embodiments described hereinmay be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the embodimentsdescribed herein may be made without departing from the spirit of theinventions. The accompanying claims and their equivalents are intendedto cover such forms or modification as would fall within the scope andspirit of the inventions.

1. A semiconductor light emitting device, comprising: a semiconductorlayer including a light emitting layer, a first major surface, and asecond major surface formed on a side opposite to the first majorsurface; a first electrode provided on the second major surface in aregion including the light emitting layer; a second electrode providedon the second major surface; an insulating layer provided on a side ofthe second major surface of the semiconductor layer, the insulatinglayer having a first opening reaching the first electrode and a secondopening reaching the second electrode; a first interconnect layerprovided in the first opening and on a face of the insulating layer on aside opposite to the semiconductor layer to connect to the firstelectrode; a second interconnect layer provided in the second openingand on a face of the insulating layer on a side opposite to thesemiconductor layer to connect to the second electrode; a first metalpillar provided on a face of the first interconnect layer on a sideopposite to the first electrode; a second metal pillar provided on aface of the second interconnect layer on a side opposite to the secondelectrode; a film covering a side face of the first metal pillar and aside face of the second metal pillar, the film having a solderwettability poorer than a solder wettability of the first metal pillarand a solder wettability of the second metal pillar; and a resin layerprovided between the first metal pillar and the second metal pillar andcovering at least part of the film.
 2. The device of claim 1, whereinthe film is an insulating film.
 3. The device of claim 2, wherein thefirst metal pillar and the second metal pillar include copper, and thefilm is black oxide of the copper.
 4. The device of claim 1, wherein thefilm is a metal film made of a metal different from the first metalpillar and the second metal pillar.
 5. The device of claim 1, whereineach of a thickness of the first metal pillar and a thickness of thesecond metal pillar is thicker than a thickness of a stacked bodyincluding the semiconductor layer, the first electrode, the secondelectrode, the insulating layer, the first interconnect layer, and thesecond interconnect layer.
 6. The device of claim 1, wherein a surfacearea of the first electrode is greater than a surface area of the secondelectrode.
 7. The device of claim 1, wherein a contact surface areabetween the second interconnect layer and the second metal pillar isgreater than a contact surface area between the second interconnectlayer and the second electrode.
 8. The device of claim 1, wherein aportion of the second interconnect layer extends over the insulatinglayer to a position to facing the light emitting layer.
 9. The device ofclaim 1, wherein the film surrounds the first metal pillar and thesecond metal pillar, respectively, in a view perpendicular to the firstmajor surface.
 10. The device of claim 1, wherein the resin layersurrounds the first metal pillar and the second metal pillar,respectively, with interposing the film therebetween, in a viewperpendicular to the first major surface.
 11. The device of claim 1,wherein the film covers a side face of a part of the first interconnectlayer and the second interconnect layer, and the part is providedoutside of first and second openings.
 12. A semiconductor light emittingdevice, comprising: a semiconductor layer including a light emittinglayer, a first major surface, and a second major surface formed on aside opposite to the first major surface; a first electrode provided onthe second major surface in a region including the light emitting layer;a second electrode provided on the second major surface; an insulatinglayer provided on the second major surface side of the semiconductorlayer, the insulating layer having a first opening reaching the firstelectrode and a second opening reaching the second electrode; a firstinterconnect layer provided in the first opening and on a face of theinsulating layer on a side opposite to the semiconductor layer toconnect to the first electrode; a second interconnect layer provided inthe second opening and on a face of the insulating layer on the sideopposite to the semiconductor layer to connect to the second electrode;a first metal pillar provided on a face of the first interconnect layeron a side opposite to the first electrode, the first metal pillarincluding a side face having recesses and protrusions; a second metalpillar provided on a face of the second interconnect layer on a sideopposite to the second electrode, the second metal pillar including aside face having recesses and protrusions; and a resin layer coveringthe side face of the first metal pillar and the side face of the secondmetal pillar.
 13. The device of claim 12, wherein each of a thickness ofthe first metal pillar and a thickness of the second metal pillar isthicker than a thickness of a stacked body including the semiconductorlayer, the first electrode, the second electrode, the insulating layer,the first interconnect layer, and the second interconnect layer.
 14. Thedevice of claim 12, wherein a surface area of the first electrode isgreater than a surface area of the second electrode.
 15. The device ofclaim 12, wherein a contact surface area between the second interconnectlayer and the second metal pillar is greater than a contact surface areabetween the second interconnect layer and the second electrode.
 16. Thedevice of claim 12, wherein a portion of the second interconnect layerextends over the insulating layer to a position to facing the lightemitting layer.
 17. The device of claim 12, wherein the recesses andprotrusions of the first metal pillar and the second metal pillar have afolding screen shape.
 18. A method for manufacturing a semiconductorlight emitting device, comprising: forming a first interconnect layer ina first opening of an insulating layer and on a face of the insulatinglayer on a side opposite to a semiconductor layer, the insulating layerbeing provided on a second major surface side of the semiconductor layerwhich includes a light emitting layer, a first major surface, and thesecond major surface opposite to the first major surface, the firstopening which reaches a first electrode provided on the second majorsurface; forming a second interconnect layer in a second opening of theinsulating layer and on the face of the insulating layer on the sideopposite to the semiconductor layer, the second opening which reaches asecond electrode provided on the second major surface; forming a firstmetal pillar on a face of the first interconnect layer on a sideopposite to the first electrode; forming a second metal pillar on a faceof the second interconnect layer on a side opposite to the secondelectrode; covering a side face of the first metal pillar and a sideface of the second metal pillar with a film having a solder wettabilitypoorer than a solder wettability of the first metal pillar and a solderwettability of the second metal pillar; and covering a periphery of thefilm with a resin layer, and providing the resin layer between the firstmetal pillar and the second metal pillar.
 19. The method of claim 18,wherein an insulative inorganic film is formed as the film on the sideface of the first metal pillar and the side face of the second metalpillar by chemical vapor deposition (CVD) or physical vapor deposition(PVD).
 20. The method of claim 18, wherein the first metal pillar andthe second metal pillar include copper, and the film of black oxide ofthe copper is formed on the side face of the first metal pillar and theside face of the second metal pillar by oxidizing the copper.
 21. Themethod of claim 20, wherein the forming of the first metal pillar andthe second metal pillar includes: after forming the first interconnectlayer and the second interconnect layer, forming a resist on a face ofthe insulating layer on a side opposite to the semiconductor layer, theresist having an opening reaching the first interconnect layer and anopening reaching the second interconnect layer; and forming the firstmetal pillar in the opening reaching the first interconnect layer andthe second metal pillar in the opening reaching the second interconnectlayer by performing electroplating using the resist as a mask, and theforming of the film includes: after forming the first metal pillar andthe second metal pillar, exposing the side face of the first metalpillar and the side face of the second metal pillar by removing theresist; and oxidizing the copper included in the first metal pillar andthe second metal pillar by supplying chemicals to the exposed side faceof the first metal pillar and the exposed side face of the second metalpillar.
 22. The method of claim 18, wherein the forming of the filmincludes after forming the first interconnect layer and the secondinterconnect layer, forming a resist on a face of the insulating layeron a side opposite to the semiconductor layer, the resist having anopening reaching the first interconnect layer and an opening reachingthe second interconnect layer; and forming a metal film on an inner faceof the openings, the metal film being made of a metal different from thefirst metal pillar and the second metal pillar, after the forming of themetal film, the first metal pillar being formed in the opening reachingthe first interconnect layer and the second metal pillar being formed inthe opening reaching the second interconnect layer.